FEMTOLINE薄型AR透镜@ 760-840 NM



薄透镜,在760-840 nm范围内具有抗反射镀膜。透镜可以提供电子束(+ AR)或IBS(+ AR800HT)镀膜。
产品介绍
Ø增透膜AR / AR @ 760-840 nm
Ø非常薄的厚度:边缘厚度在0.5到1.9mm之间变化
Ø中心厚度从1到3mm不等
Ø平凸或平凹类型
Ø未镀膜,BBAR镀膜@ 700-900 nm或UBBAR镀膜@ 350-900 nm
EKSMA OPTICS推出增透膜,可在760-840 nm波长范围内操作。低于给定值的透镜可确保低群延迟色散,是飞秒Ti:Sapphire激光脉冲应用的理想选择。
产品型号
平凸透镜(ø12.7 mm)
型号 | 材料 | 类型 | 直径 | CT | ET | 焦距@ 800NM | 反射 |
110-1106ET+AR | UVFS | pl/cx | 12.7 mm | 2.5 mm | 1.0 mm | 30 mm | R<0.5% |
110-1106ET+AR800HT | UVFS | pl/cx | 12.7 mm | 2.5 mm | 1.0 mm | 30 mm | R<0.1% |
110-1108ET+AR | UVFS | pl/cx | 12.7 mm | 1.8 mm | 0.7 mm | 40 mm | R<0.5% |
110-1108MT+AR | UVFS | pl/cx | 12.5 mm | 1.8 mm | 0.7 mm | 40 mm | R<0.5% |
110-1108ET+AR800HT | UVFS | pl/cx | 12.7 mm | 1.8 mm | 0.7 mm | 40 mm | R<0.1% |
110-1109ET+AR | UVFS | pl/cx | 12.7 mm | 1.9 mm | 1.0 mm | 50 mm | R<0.5% |
110-1109MT+AR | UVFS | pl/cx | 12.5 mm | 1.9 mm | 1.0 mm | 50 mm | R<0.5% |
110-1109ET+AR800HT | UVFS | pl/cx | 12.7 mm | 1.9 mm | 1.0 mm | 50 mm | R<0.1% |
110-1111ET+AR | UVFS | pl/cx | 12.7 mm | 1.8 mm | 1.2 mm | 75 mm | R<0.5% |
110-1111MT+AR | UVFS | pl/cx | 12.5 mm | 1.8 mm | 1.2 mm | 75 mm | R<0.5% |
110-1111ET+AR800HT | UVFS | pl/cx | 12.7 mm | 1.8 mm | 1.2 mm | 75 mm | R<0.1% |
110-1115ET+AR | UVFS | pl/cx | 12.7 mm | 1.5 mm | 0.9 mm | 100 mm | R<0.5% |
110-1115MT+AR | UVFS | pl/cx | 12.5 mm | 1.5 mm | 0.9 mm | 100 mm | R<0.5% |
110-1115ET+AR800HT | UVFS | pl/cx | 12.7 mm | 1.5 mm | 0.9 mm | 100 mm | R<0.1% |
110-1117ET+AR | UVFS | pl/cx | 12.7 mm | 1.4 mm | 1.0 mm | 125 mm | R<0.5% |
110-1117ET+AR800HT | UVFS | pl/cx | 12.7 mm | 1.4 mm | 1.0 mm | 125 mm | R<0.1% |
110-1119ET+AR | UVFS | pl/cx | 12.7 mm | 1.5 mm | 1.2 mm | 150 mm | R<0.5% |
110-1119MT+AR | UVFS | pl/cx | 12.5 mm | 1.5 mm | 1.2 mm | 150 mm | R<0.5% |
110-1119ET+AR800HT | UVFS | pl/cx | 12.7 mm | 1.5 mm | 1.2 mm | 150 mm | R<0.1% |
110-1121ET+AR | UVFS | pl/cx | 12.7 mm | 1.2 mm | 1.0 mm | 175 mm | R<0.5% |
110-1121MT+AR | UVFS | pl/cx | 12.5 mm | 1.2 mm | 1.0 mm | 175 mm | R<0.5% |
110-1121ET+AR800HT | UVFS | pl/cx | 12.7 mm | 1.2 mm | 1.0 mm | 175 mm | R<0.1% |
110-1123ET+AR | UVFS | pl/cx | 12.7 mm | 1.2 mm | 1.0 mm | 200 mm | R<0.5% |
110-1123ET+AR800HT | UVFS | pl/cx | 12.7 mm | 1.2 mm | 1.0 mm | 200 mm | R<0.1% |
110-1126ET+AR | UVFS | pl/cx | 12.7 mm | 1.1 mm | 1.0 mm | 250 mm | R<0.5% |
110-1126ET+AR800HT | UVFS | pl/cx | 12.7 mm | 1.1 mm | 1.0 mm | 250 mm | R<0.1% |
110-1129ET+AR | UVFS | pl/cx | 12.7 mm | 1.1 mm | 1.0 mm | 300 mm | R<0.5% |
110-1129ET+AR800HT | UVFS | pl/cx | 12.7 mm | 1.1 mm | 1.0 mm | 300 mm | R<0.1% |
110-1133ET+AR | UVFS | pl/cx | 12.7 mm | 1.1 mm | 1.0 mm | 400 mm | R<0.5% |
110-1133MT+AR | UVFS | pl/cx | 12.5 mm | 1.1 mm | 1.0 mm | 400 mm | R<0.5% |
110-1133ET+AR800HT | UVFS | pl/cx | 12.7 mm | 1.1 mm | 1.0 mm | 400 mm | R<0.1% |
110-1135ET+AR | UVFS | pl/cx | 12.7 mm | 1.1 mm | 1.0 mm | 450 mm | R<0.5% |
110-1135MT+AR | UVFS | pl/cx | 12.5 mm | 1.1 mm | 1.0 mm | 450 mm | R<0.5% |
110-1135ET+AR800HT | UVFS | pl/cx | 12.7 mm | 1.1 mm | 1.0 mm | 450 mm | R<0.1% |
110-1137ET+AR | UVFS | pl/cx | 12.7 mm | 1.1 mm | 1.0 mm | 500 mm | R<0.5% |
110-1137MT+AR | UVFS | pl/cx | 12.5 mm | 1.1 mm | 1.0 mm | 500 mm | R<0.5% |
110-1137ET+AR800HT | UVFS | pl/cx | 12.7 mm | 1.1 mm | 1.0 mm | 500 mm | R<0.1% |
材料 | UV FS |
表面质量 | 40-20表面光洁度 (MIL-PRF-13830B) |
通光孔径 | 90% of the diameter
|
直径公差 | +0.00, -0.12 mm |
厚度公差 | ±0.2 mm |
表面不规则 | λ/8 @ 633 nm
|
同心度 | 3 arcmin
|
近轴焦距 | ±2% @ 800 nm
|
技术 | 电子束多层电介质 |
附着力和耐久性 | 符合MIL-C-675A。不溶于实验室溶剂 |
通光孔径 | 超过中心直径的85% |
损坏阈值 | 100 mJ / cm2,50 fsec脉冲,典型800 nm |
镀膜表面平整度 | 通光孔径下633 nm处的λ/ 10 |
入射角 | 0度 |